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Electron transport measurements on 60-nm-thick multilayers containing N = 2–58 individual Ru and Co layers are employed to quantify the specific resistance of Ru/Co interfaces. Sputter deposition on Al2O3(0001) at Ts = 400 °C leads to a 0001 preferred orientation with x-ray diffraction (XRD) Ru and Co 0002 peaks that shift closer to each other with increasing N, suggesting interfacial intermixing. The intermixing is quantified by x-ray reflectivity (XRR) and confirmed by an XRD Ru/Co alloy peak that develops during in situ synchrotron annealing as well as for deposition at a higher Ts = 600 °C. The room-temperature resistivity increases from 15.0 to 47.5 μΩ cm with decreasing superlattice period Λ = 60–2 nm. This is attributed to increasing electron scattering at the intermixed metal interfaces. The transport data are well described by a parallel conductor model that treats metal layers and the intermixed alloy as parallel resistors, where the resistivity of the intermixed alloy of 60.4 μΩ cm is determined from a co-deposited Ru/Co sample. Data fitting provides values for the effective thickness of the intermixed interface of 16.8 nm, in good agreement with the XRR value, yielding a Ru/Co contact resistance of 8.5 × 10−15 Ω m2 for interfaces deposited at 400 °C. The overall results show that the Ru/Co contact resistance is dominated by a high-resistivity interfacial alloy and, therefore, is a strong function of the deposition process, particularly the processing temperature. 

Epitaxial W–Mo multilayers are employed as a model system to demonstrate how resistivity measurements parallel to metal–metal interfaces can be used to quantify the specific interface resistance without sub-10-nm patterning that would be required for direct transport measurements across the interface. 50-nm-thick epitaxial multilayer stacks containing 2–60 individual W(001) and Mo(001) layers are deposited on MgO(001) substrates and their resistivity ρ measured as a function of superlattice period Λ at 293 and 77 K. The measured room temperature ρ increases from 7.10 to 8.62 μΩ cm with decreasing Λ = 50–1.7 nm, which is attributed to the increasing electron-interface scattering. The semiclassical Fuchs–Sondheimer model for surface scattering dramatically overestimates the resistivity, which is attributed to coherent electron transmission across multiple interfaces. A new Boltzmann transport model treats each interface as a boundary condition where electrons either scatter diffusely or traverse without momentum loss with a probability T for the first encountered interface and with 100% transmission at subsequent interfaces until they are relaxed by a bulk scattering event. This model has a single unknown parameter T, which becomes the fitting parameter for experimental data analysis, yielding a temperature-independent T = 0.8 ± 0.1 and a corresponding contact resistance at the W(001)–Mo(001) interface of 2.6 × 10−16 Ω m2.